Patent · US Active

Micro-selective sintering laser systems and methods thereof

US10722947B2 · kind B2 · utility

2Cited by
8References
31Claims
0Family size

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Key dates

Filing dateMar 31, 2017
Grant dateJul 28, 2020
Priority date
Expiry dateOct 16, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P10/25
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A microscale selective laser sintering (μ-SLS) that improves the minimum feature-size resolution of metal additively manufactured parts by up to two orders of magnitude, while still maintaining the throughput of traditional additive manufacturing processes. The microscale selective laser sintering includes, in some embodiments, ultra-fast lasers, a micro-mirror based optical system, nanoscale powders, and a precision spreader mechanism. The micro-SLS system is capable of achieving build rates of at least 1 cm3/hr while achieving a feature-size resolution of approximately 1 μm. In some embodiments, the exemplified systems and methods facilitate a direct write, microscale selective laser sintering μ-SLS system that is configured to write 3D metal structures having features sizes down to approximately 1 μm scale on rigid or flexible substrates. The exemplified systems and methods may operate on a variety of material including, for example, polymers, dielectrics, semiconductors, and metals.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.