Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method
US10734190B2 · kind B2 · utility
2Cited by
1References
10Claims
0Family size
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Key dates
| Filing date | May 17, 2019 |
| Grant date | Aug 4, 2020 |
| Priority date | — |
| Expiry date | May 17, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multiple electron beam irradiation apparatus includes an electromagnetic lens configured to refract multiple electron beams incident, an aberration corrector arranged in the magnetic field of the electromagnetic lens and configured to be able to individually apply a bias potential and a deflection potential to each of the multiple electron beams, and an objective lens configured to focus the multiple electron beams, a trajectory of the each of which has been individually corrected by the bias potential and the deflection potential, onto a target object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.