John G. Hartley
26Patents
8h-index
30Co-inventors
75Inventor score
Filing activity: Jun 6, 1995 → Mar 5, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5825039A | Digitally stepped deflection raster system and method of use thereof | Electricity | 30 | Expired |
| US5621216A | Hardware/software implementation for multipass E-beam mask writing | Electricity | 24 | Expired |
| US5773836A | Method for correcting placement errors in a lithography system | Electricity | 22 | Expired |
| US5798528A | Correction of pattern dependent position errors in electron beam lithography | Electricity | 15 | Expired |
| US5570405A | Registration and alignment technique for X-ray mask fabrication | Physics | 12 | Expired |
| US6177680A | Correction of pattern-dependent errors in a particle beam lithography system | Electricity | 12 | Expired |
| US6291819A | Method of calibrating an electron beam system for lithography | Electricity | 11 | Expired |
| US6437347B1 | Target locking system for electron beam lithography | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6614035B2 | Multi-beam shaped beam lithography system | Electricity | 8 | Expired |
| US5916716A | Emulation methodology for critical dimension control in E-Beam lithography | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6822248B2 | Spatial phase locking with shaped electron beam lithography | Electricity | 6 | Expired |
| US6091072A | Piece-wise processing of very large semiconductor designs | Electricity | 5 | Expired |
| US6090528A | Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5917932A | System and method for evaluating image placement on pre-distorted masks | Electricity | 4 | Expired |
| US6486953B1 | Accurate real-time landing angle and telecentricity measurement in lithographic systems | Performing Operations; Transporting | 2 | Expired |
| US10734190B2 | Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method | Electricity | 2 | Active |
| US11145485B2 | Multiple electron beams irradiation apparatus | Electricity | 1 | Active |
| US5838013A | Method for monitoring resist charging in a charged particle system | Electricity | 1 | Expired |
| US11139138B2 | Multiple electron beams irradiation apparatus | Electricity | 1 | Active |
| US9177817B2 | Methods for fabricating three-dimensional nano-scale structures and devices | Electricity | 1 | Active |
| US10937623B2 | Deflector for multiple electron beams and multiple beam image acquiring apparatus | Electricity | 0 | Active |
| US6818906B1 | Electron beam position reference system | Electricity | 0 | Expired |
| US11615938B2 | High-resolution multiple beam source | Electricity | 0 | Active |
| US11621144B2 | Electron optical system and multi-beam image acquiring apparatus | Electricity | 0 | Active |
| US6369396B1 | Calibration target for electron beams | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.