Patent · US Active

Coating device and coating method

US10734584B2 · kind B2 · utility

0Cited by

3References

10Claims

0Family size

Assignee

AIXTRON SE · DE

Inventors

Markus Gersdorff · Salzburg, AT
Markus Jakob · Monschau, DE
Markus Schwambera · Aachen, DE

Key dates

Filing date	Jun 8, 2017
Grant date	Aug 4, 2020
Priority date	—
Expiry date	Jun 8, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH10K71/40
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A device for depositing a layer onto one or more substrates includes a process chamber; a gas inlet element, which can be temperature-controlled, for delivering a process gas into the process chamber in a flow direction towards the substrates; a shielding element, arranged directly after the gas inlet element in the flow direction and which, when in a shielding position, thermally insulates the gas inlet element and the substrates from each other; mask holders arranged after the shielding element in the flow direction, each for holding a mask; and substrate holders for holding at least one of the substrates, each substrate holder corresponding to one of the plurality of mask holders. For each of the substrate holders, a displacement element is provided for displacing the substrate holder from a position distant from the mask holder to a position adjacent to the mask holder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.