Model-based control of substrate processing systems
US10741429B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2018 |
| Grant date | Aug 11, 2020 |
| Priority date | — |
| Expiry date | Jul 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/49004
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system for controlling a parameter of a plant associated with a substrate processing chamber is disclosed. A measuring circuit measures a response of the plant associated with the substrate processing chamber when the parameter of the plant is changed. A model generating circuit determines a delay and a gain of the plant based on the response. The model generating circuit generates a model of the plant based on the delay, the gain, and a time constant of the plant. A predicting circuit receives a set point for the parameter and a measurement of the parameter, generates a value of a prediction of the parameter based on the set point for the parameter and the measurement of the parameter using the model, wherein the value of the prediction of the parameter does not include the delay, compares the value of the prediction of the parameter with the set point to generate a control signal, and controls the parameter of the plant based on the control signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.