Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
US10750604B2 · kind B2 · utility
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2References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 22, 2016 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Nov 22, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0023
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.