Microwave plasma equipment and method of exciting plasma
US10750606B1 · kind B1 · utility
6Cited by
18References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2019 |
| Grant date | Aug 18, 2020 |
| Priority date | — |
| Expiry date | Jun 20, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/461
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A microwave plasma equipment and a method of exciting plasma are disclosed. The microwave plasma equipment includes: a plasma reaction device having a cavity in which a base support and a plasma-forming area is provided; a conversion device having gradient electrodes, the gradient electrodes being disposed inside the cavity and configured to generate a gradient electric field in the plasma-forming area; a gas supply device configured to introduce gas into the cavity of the plasma reaction device; and a microwave generating device configured to generate and transmit microwave into the cavity of the plasma reaction device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.