Expediting spectral measurement in semiconductor device fabrication
US10761034B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Aug 23, 2017 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Aug 23, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/066
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.