Etay Lavert
6Patents
1h-index
22Co-inventors
43Inventor score
Filing activity: Aug 23, 2017 → Jan 16, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11556738B2 | System and method for determining target feature focus in image-based overlay metrology | Physics | 1 | Active |
| US11921825B2 | System and method for determining target feature focus in image-based overlay metrology | Physics | 0 | Active |
| US12131959B2 | Systems and methods for improved metrology for semiconductor device wafers | Physics | 0 | Active |
| US11237120B2 | Expediting spectral measurement in semiconductor device fabrication | Physics | 0 | Active |
| US10761034B2 | Expediting spectral measurement in semiconductor device fabrication | Physics | 0 | Active |
| US12111580B2 | Optical metrology utilizing short-wave infrared wavelengths | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.