Narrow etched gaps or features in multi-period thin-film structures
US10762940B2 · kind B2 · utility
1Cited by
25References
15Claims
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Key dates
| Filing date | Dec 6, 2017 |
| Grant date | Sep 1, 2020 |
| Priority date | — |
| Expiry date | Jul 9, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/3996
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Multi-period thin-film structures exhibiting giant magnetoresistance (GMR) are described. Techniques are also described by which narrow spacing and/or feature size may be achieved for such structures and other thin-film structures having an arbitrary number of periods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.