Patent · US Active

Reflective diffraction grating and fabrication method

US10768349B2 · kind B2 · utility

0Cited by
9References
25Claims
0Family size

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Key dates

Filing dateJun 30, 2017
Grant dateSep 8, 2020
Priority date
Expiry dateAug 31, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/001
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.