Photocuring method, compound and composition used therein
US10774062B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 25, 2017 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Jan 25, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/004
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound.The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound.Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group.Step 2: this is a step in which in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to crea…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.