Patent · US Active

Flow control system, method, and apparatus

US10782710B2 · kind B2 · utility

4Cited by

190References

20Claims

0Family size

Assignee

ICHOR SYSTEMS, INC.

Inventors

Daniel T. Mudd · Reno, US
Marshall B. Grill · Reno, US
Norman L. Batchelor, II · Sparks, US

Key dates

Filing date	Apr 15, 2019
Grant date	Sep 22, 2020
Priority date	—
Expiry date	Apr 15, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG05D7/0682
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The second flow component mounting region has a second inlet port, a second outlet port, and a first auxiliary port.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.