Methods of fluorinating filters used in the manufacture of a semiconductor device
US10786787B2 · kind B2 · utility
0Cited by
4References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 25, 2017 |
| Grant date | Sep 29, 2020 |
| Priority date | — |
| Expiry date | Jul 4, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D71/262
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A semiconductor filter may be treated by fluorinating the surface of the filter. The filter has a polymer membrane held by a support structure within the filter's housing. The housing has an inlet and outlet for fluids being filtered, with the membrane held between the inlet and outlet. The support structure holds the membrane such that fluids flowing through the filter pass through the membrane. The treatment purges air from the filter before flowing a gas mixture including a fluorination agent through the filter, including the membrane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.