Cesar M. Garza
13Patents
6h-index
22Co-inventors
66Inventor score
Filing activity: Feb 3, 1987 → Dec 25, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4891303A | Trilayer microlithographic process using a silicon-based resist as the middle layer | Electricity | 140 | Expired |
| US4770739A | Bilayer photoresist process | Emerging Cross-Sectional Technologies | 45 | Expired |
| US4882008A | Dry development of photoresist | Physics | 42 | Expired |
| US5094936A | High pressure photoresist silylation process and apparatus | Physics | 19 | Expired |
| US6593033B1 | Attenuated rim phase shift mask | Physics | 6 | Expired |
| US6649452B2 | Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer | Physics | 6 | Expired |
| US5716738A | Dark rims for attenuated phase shift mask | Physics | 4 | Expired |
| US7157377B2 | Method of making a semiconductor device using treated photoresist | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5085729A | Uniformity using stagnant silylation | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6849515B1 | Semiconductor process for disposable sidewall spacers | Electricity | 2 | Expired |
| US7901852B2 | Metrology of bilayer photoresist processes | Electricity | 1 | Active |
| US6797440B2 | Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device | Physics | 0 | Expired |
| US10786787B2 | Methods of fluorinating filters used in the manufacture of a semiconductor device | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.