Patent · US Active

Array substrate with diffuse reflection layer, method for manufacturing the same, and display device comprising the same

US10795228B2 · kind B2 · utility

1Cited by

1References

20Claims

0Family size

Assignees

BOE Technology Group Co., Ltd. · CN
Ordos Yuansheng Optoelectronics Co., Ltd. · CN

Inventors

Lei Yao · Beijing, CN
Dawei Shi · Beijing, CN
Wentao Wang · Tallahassee, US
Lu Yang · Beijing, CN
Haifeng Xu · San Diego, US
Lei Yan · Beijing, CN
Jinfeng Wang · Shanghai, CN
Xiaowen SI · Beijing, CN
Fang Yan · Zhaoyuan, CN
Jinjin Xue · Beijing, CN
Lin Hou · Leuven, BE
Yuanbo Li · Luoyang, CN
Zhixuan Guo · Beijing, CN
Xiaofang Li · Tangxia, CN

Key dates

Filing date	Sep 5, 2018
Grant date	Oct 6, 2020
Priority date	—
Expiry date	Nov 8, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH10K59/131
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present disclosure provides an array substrate, a method for manufacturing the same, and a display device. The array substrate includes a base substrate, and gate lines and data lines arranged on the base substrate to define a plurality of pixel regions, and a diffuse reflection layer arranged in the plurality of pixel regions, in which a surface of the diffuse reflection layer facing a light emitting side of the array substrate is uneven.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.