Compositions for removing photoresist
US10795263B2 · kind B2 · utility
0Cited by
6References
7Claims
0Family size
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Key dates
| Filing date | May 23, 2018 |
| Grant date | Oct 6, 2020 |
| Priority date | — |
| Expiry date | Dec 4, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.