Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US10802399B2 · kind B2 · utility
2Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2018 |
| Grant date | Oct 13, 2020 |
| Priority date | — |
| Expiry date | Aug 23, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07J43/003
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.