Tomotaka Tsuchimura
75Patents
6h-index
63Co-inventors
71Inventor score
Filing activity: Aug 10, 2001 → Jun 18, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8900791B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | Emerging Cross-Sectional Technologies | 18 | Active |
| US7618683B2 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | Emerging Cross-Sectional Technologies | 15 | Active |
| US7799505B2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | Emerging Cross-Sectional Technologies | 14 | Active |
| US10120281B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Physics | 6 | Active |
| US8008364B2 | Curable composition | Emerging Cross-Sectional Technologies | 6 | Active |
| US8148044B2 | Positive photosensitive composition | Emerging Cross-Sectional Technologies | 6 | Active |
| US9904167B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | Chemistry; Metallurgy | 6 | Active |
| US8329379B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | Physics | 5 | Active |
| US8110333B2 | Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound | Emerging Cross-Sectional Technologies | 5 | Active |
| US9798234B2 | Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask | Physics | 4 | Active |
| US9223208B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | Physics | 4 | Active |
| US8110324B2 | Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor | Physics | 4 | Active |
| US8278386B2 | Dispersion composition, polymerizable composition, light-shielding color filter, solid-state image pick-up element, liquid crystal display device, wafer level lens, and image pick-up unit | Physics | 4 | Active |
| US8962233B2 | Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition | Chemistry; Metallurgy | 3 | Active |
| US9958775B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask | Chemistry; Metallurgy | 3 | Active |
| US6689534B2 | Planographic printing original plate | Performing Operations; Transporting | 3 | Expired |
| US8735048B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | Physics | 3 | Active |
| US9718901B2 | Resin composition and pattern forming method using the same | Physics | 3 | Active |
| US6958206B2 | Image recording material and lithographic printing plate precursor | Emerging Cross-Sectional Technologies | 3 | Expired |
| US9235116B2 | Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | Physics | 3 | Active |
| US8637220B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US9069246B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these | Physics | 2 | Active |
| US8673538B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | Physics | 2 | Active |
| US10802399B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Chemistry; Metallurgy | 2 | Active |
| US9400430B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | Physics | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.