Patent · US Active

Pellicle for photomask and method of fabricating the same

US10809614B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

SAMSUNG ELECTRONICS CO., LTD. · KR

Inventors

Mun Ja Kim · Mado-myeon, KR
Changyoung Jeong · Osan-si, KR

Key dates

Filing date	Dec 10, 2018
Grant date	Oct 20, 2020
Priority date	—
Expiry date	Apr 17, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/62
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A pellicle for a photomask comprises a pellicle membrane. The pellicle membrane includes a base layer having a first surface and a second surface facing the first surface, and a first recovery layer covering the first surface of the base layer. A content of SP2 covalent bonds between carbon atoms contained in the first recovery layer is less than or equal to a content of SP2 covalent bonds between carbon atoms contained in the base layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.