Patent · US Active

Optical arrangement, in particular lithography system

US10809636B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Bernhard Gellrich · Aalen, DE
Ralf Zweering · Aalen, DE
Charles Seviour · Aalen, DE
Michael Erath · Dietenheim, DE
Jens Prochnau · Oberkochen, DE
Marwene Nefzi · Ulm, DE
Viktor Kulitzki · Zwickau, DE
Axel Lorenz · Meißen, DE
Stefan Schaff · Ellwangen, DE

Key dates

Filing date	Jul 16, 2019
Grant date	Oct 20, 2020
Priority date	—
Expiry date	Jul 16, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.