Charged particle beam system

US10811215B2 · kind B2 · utility

Assignee

• Carl Zeiss MultiSEM GmbH · DE

Inventors

• Dirk Zeidler · Oberkochen, DE
• Stefan Schubert · Oberkochen, DE
• Ingo Mueller · Heidelberg, DE
• Joerg Jacobi · Herbrechtingen, DE
• Mario Muetzel · Oberkochen, DE
• Antonio Casares · Aalen, DE
• Christof Riedesel · Oberkochen, DE

Key dates

• Filing date: May 20, 2019
• Grant date: Oct 20, 2020
• Expiry date: May 20, 2039

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/2801
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.