Sub-ground rule e-Fuse structure
US10811353B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2018 |
| Grant date | Oct 20, 2020 |
| Priority date | — |
| Expiry date | Nov 17, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L23/53238
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A mandrel structure includes a first mandrel, a second mandrel and a third mandrel in a parallel arrangement. The second mandrel is located between the first and third mandrels and has a cut larger than a minimum ground rule feature. A sidewall layer is formed over the mandrel structure. The sidewall layer has two long parallel gaps for two contact lines and a third gap for a fuse element. The third gap is orthogonal to and connects the two long parallel gaps. The sidewall pattern is used to form a trench structure comprising two parallel contact line trenches having a width at least as great as a ground rule of the patterning process for the contact lines and an orthogonal fuse element trench having a width less than the ground rule for the fuse element. A conductive material forms the contact lines and a fuse element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.