High throughput, high resolution optical metrology for reflective and transmissive nanophotonic devices
US10816482B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2017 |
| Grant date | Oct 27, 2020 |
| Priority date | — |
| Expiry date | Oct 26, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/59
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure regards a large area functional metrology system for inspecting nanophotonic devices. The large area functional metrology system can include one or more light sources, optical components such as lenses and polarizers, and one or more camera sensors. The light source can irradiate light onto a nanophotonic device while the optical components can guide the light through the system and modulate states of the light. The camera sensor can record images of the nanophotonic device interacting with the irradiated light. The images can be taken as a function of one or more states. The system can also include a detector which can processes the images in order to detect defects. The defects can then be classified using one or more defect signatures. Based on this classification, the root causes of the defects can be automatically identified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.