Shrawan Singhal
18Patents
5h-index
23Co-inventors
62Inventor score
Filing activity: Feb 25, 2009 → Jun 10, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10026609B2 | Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures | Emerging Cross-Sectional Technologies | 46 | Active |
| US9415418B2 | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy | Performing Operations; Transporting | 35 | Active |
| US9718096B2 | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy | Electricity | 21 | Active |
| US9987653B2 | Versatile process for precision nanoscale manufacturing | Performing Operations; Transporting | 20 | Active |
| US7815824B2 | Real time imprint process diagnostics for defects | Performing Operations; Transporting | 6 | Active |
| US10816482B2 | High throughput, high resolution optical metrology for reflective and transmissive nanophotonic devices | Physics | 3 | Active |
| US8187515B2 | Large area roll-to-roll imprint lithography | Performing Operations; Transporting | 3 | Active |
| US10336062B2 | Systems and methods for precision inkjet printing | Performing Operations; Transporting | 1 | Active |
| US12009247B2 | Heterogeneous integration of components onto compact devices using moiré based metrology and vacuum based pick-and-place | Electricity | 0 | Active |
| US12094775B2 | Nanoscale-aligned three-dimensional stacked integrated circuit | Electricity | 0 | Active |
| US11669009B2 | Roll-to-roll programmable film imprint lithography | Physics | 0 | Active |
| US12168244B2 | Nanoscale thin film deposition systems | Physics | 0 | Active |
| US12308275B2 | Heterogeneous integration of components onto compact devices using moiré based metrology and vacuum based pick-and-place | Electricity | 0 | Active |
| US12424498B2 | System and method for modification of substrates | Performing Operations; Transporting | 0 | Active |
| US10717646B2 | Precision alignment of the substrate coordinate system relative to the inkjet coordinate system | Performing Operations; Transporting | 0 | Active |
| US11600525B2 | Nanoscale-aligned three-dimensional stacked integrated circuit | Electricity | 0 | Active |
| US11469131B2 | Heterogeneous integration of components onto compact devices using moire based metrology and vacuum based pick-and-place | Electricity | 0 | Active |
| US11762284B2 | Wafer-scale programmable films for semiconductor planarization and for imprint lithography | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.