Image contrast in X-ray topography imaging for defect inspection
US10816487B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2019 |
| Grant date | Oct 27, 2020 |
| Priority date | — |
| Expiry date | Feb 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/6462
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for X-ray topography, the system includes a source assembly, a detector assembly, a filter and a processor. The source assembly is configured to direct at least an X-ray beam to impinge, at an angle, on a first surface of a sample, the X-ray beam is divergent when impinging on the first surface. The detector assembly is configured to detect the X-ray beam that had entered the sample at the first surface, diffracted while passing through the sample and exited the sample at a second surface that is opposite to the first surface, and to produce an electrical signal in response to the detected X-ray beam. The filter is mounted between the source assembly and the first surface, and is configured to attenuate an intensity of a selected spectral portion of the X-ray beam. The processor is configured to detect one or more defects in the sample based on the electrical signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.