Metal analysis during pharmaceutical manufacturing
US10823687B2 · kind B2 · utility
1Cited by
63References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 3, 2016 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | Nov 4, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/652
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for detecting, measuring, and analyzing for metallic impurities in pharmaceutical drugs and compounds utilizes an x-ray fluorescence system. The system and method may be co-located with a pharmaceutical manufacturing process for in-line continuous monitoring of metal impurities. The pharmaceutical products may be in a form selected from a powder, slurry, pill, tablet, and gel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.