Vertical semiconductor devices
US10825830B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2019 |
| Grant date | Nov 3, 2020 |
| Priority date | — |
| Expiry date | May 22, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vertical semiconductor device includes a substrate with a first and second region. A conductive pattern on the first region extends in a first direction. The first region includes a cell region, a first dummy region and a second dummy region. The conductive pattern extends in a first direction. A pad is disposed on the second region, the pad contacts a side of the conductive pattern. A plurality of first dummy structures extends through the conductive pattern on the first dummy region. A plurality of second dummy structures extend through the conductive pattern on the second dummy region, the second dummy structures disposed in a plurality of columns that extend in a second direction perpendicular to the first direction. Widths of upper surfaces of the second dummy structures are different in each column, and the widths of upper surfaces of the second dummy structures increase toward the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.