Patent · US Active

Lithography apparatus and method

US10831114B2 · kind B2 · utility

0Cited by

4References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Björn Liebaug · Ulm, DE
Franz-Josef Stickel · Aalen, DE
Jurgen Hofmann · Spalt, DE
Dietmar Dürr · Seligenstadt, DE

Key dates

Filing date	Aug 20, 2019
Grant date	Nov 10, 2020
Priority date	—
Expiry date	Aug 20, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.