Apparatus for splitting flow of process gas and method of operating same
US10838437B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2019 |
| Grant date | Nov 17, 2020 |
| Priority date | — |
| Expiry date | Apr 2, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04W64/00
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, an apparatus for controlling gas flow is disclosed, the apparatus delivering two gas flows at a known ratio. Specifically, the apparatus has first and second on/off valves and first and second flow restrictors. The first and second on/off valves may be altered between an open state and a closed state. When both the first and second on/off valves are in an open state, first and second gas flows are delivered to first and second outlets. The first and second gas flows are provided at a known ratio to one another, this ratio determined by the ratio of the resistance to flow of the first and second flow restrictors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.