System and method for a displacement measurement
US10845191B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Apr 9, 2019 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Apr 9, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/50
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
System and method for profiling of a surface with lateral scanning interferometer the optical axis of which is perpendicular to the surface. In-plane scanning of the surface is carried out with increments that correspond to integer number of pixels of an employed optical detector. Determination of height profile of a region-of-interest that is incomparably larger than a FOV of the interferometer objective is performed in time reduced by at least an order of magnitude as compared to time required for the same determination by a vertical scanning interferometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.