Monitoring system and method
US10845229B2 · kind B2 · utility
0Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2018 |
| Grant date | Nov 24, 2020 |
| Priority date | — |
| Expiry date | Jan 25, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01G17/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure relates to an abatement apparatus monitoring system. The abatement apparatus monitoring system includes a processor; and at least one load cell for outputting a load cell signal to the processor. The at least one load cell is configured to support a waste tank of an abatement apparatus. The processor is configured to monitor a level of a liquid in the waste tank in dependence on the load cell signal. The present disclosure also relates to an abatement system comprising an abatement apparatus monitoring system; and a method of monitoring operation of an abatement system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.