Patent · US Active

Multi-beam particle beam system

US10854423B2 · kind B2 · utility

23Cited by

9References

22Claims

0Family size

Assignee

Carl Zeiss MultiSEM GmbH · DE

Inventors

Yanko Sarov · Aalen, DE
Jan Horn · Munich, DE
Ulrich Bihr · Bopfingen, DE
Christof Riedesel · Oberkochen, DE
Erik Essers · Aalen, DE

Key dates

Filing date	Feb 15, 2019
Grant date	Dec 1, 2020
Priority date	—
Expiry date	Feb 15, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/153
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.