Patent · US Active

Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective

US10859815B2 · kind B2 · utility

0Cited by

4References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventor

Holger Walter · Aalen, DE

Key dates

Filing date	Mar 6, 2018
Grant date	Dec 8, 2020
Priority date	—
Expiry date	Jan 29, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG02B3/0081
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical correction arrangement includes a first and a second correction component arranged in succession along an optical axis. The first and the second correction components are provided with aspherical surface contours which at least approximately add up to zero overall in a zero position of the optical correction arrangement. The optical correction arrangement also includes a manipulator for displacing the first correction component in a first direction at a first speed and for displacing the second correction component in a second direction at a second speed. The first speed is greater than the second speed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.