Holger Walter
18Patents
3h-index
27Co-inventors
60Inventor score
Filing activity: Dec 8, 1994 → Apr 23, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5716590A | Catalytic hydrodehalogenation of halogen-containing compounds of group IV elements | Emerging Cross-Sectional Technologies | 23 | Expired |
| US8203696B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 16 | Active |
| US9316929B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 7 | Active |
| US10031423B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 3 | Active |
| US9760019B2 | Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus | Physics | 3 | Active |
| US9207541B2 | Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus | Physics | 3 | Active |
| US9081310B2 | Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same | Physics | 1 | Active |
| US9354524B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 1 | Active |
| US9164402B2 | Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus | Physics | 1 | Active |
| US10317802B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US10859815B2 | Optical correction arrangement, projection objective having such an optical correction arrangement and microlithographic apparatus having such a projection objective | Physics | 0 | Active |
| US10684551B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US9052609B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 0 | Active |
| US8928858B2 | Projection exposure apparatus with optimized adjustment possibility | General | 0 | Revoked |
| US9720336B2 | Microlithographic apparatus and method of varying a light irradiance distribution | Physics | 0 | Active |
| US10054860B2 | Projection exposure apparatus with optimized adjustment possibility | Physics | 0 | Active |
| US7697211B2 | Symmetrical objective having four lens groups for microlithography | Physics | 0 | Active |
| US9746778B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.