Method for manufacturing photomask and semiconductor manufacturing method thereof
US10866508B2 · kind B2 · utility
1Cited by
10References
20Claims
0Family size
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Key dates
| Filing date | Nov 7, 2018 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Feb 26, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2119/18
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a photomask is provided. The method includes generating a plurality of virtual layouts; calculating a score for each of the plurality of virtual layouts in accordance with a total overlay area; comparing the scores of the plurality of virtual layouts and determining a modified layout having a target score out of the plurality of virtual layouts; and outputting the modified layout to a photomask. Each of the virtual layouts includes a plurality of the shifted features. A semiconductor manufacturing method is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.