Inventor · Ganzikeng, TW

Chi-Ta Lu

19Patents

2h-index

17Co-inventors

47Inventor score

Filing activity: Apr 30, 2010 → Jul 27, 2023

Most-cited inventions

Patent	Title	Area	Cited by	Status
US10877380B1	Using inverse lithography technology in a method of mask data preparation for generating integrated circuit	Physics	8	Active
US8458631B2	Cycle time reduction in data preparation	Physics	3	Active
US11429019B2	Method for manufacturing semiconductor device	Physics	1	Active
US10866508B2	Method for manufacturing photomask and semiconductor manufacturing method thereof	Physics	1	Active
US11402743B2	Mask defect prevention	Physics	1	Active
US8650511B2	Lithography performance check methods and apparatus	Physics	1	Active
US10784196B2	Semiconductor structure and manufacturing method thereof	Electricity	1	Active
US11900040B2	Method and system for reducing layout distortion due to exposure non-uniformity	Physics	0	Active
US12293969B2	Semiconductor structure and manufacturing method thereof	Electricity	0	Active
US9136092B2	Structure and method for E-beam writing	Electricity	0	Active
US11860530B2	Mask defect prevention	Physics	0	Active
US12174529B2	Method for manufacturing semiconductor device	Physics	0	Active
US12124163B2	Mask defect prevention	Physics	0	Active
US11763057B2	Critical dimension uniformity	Emerging Cross-Sectional Technologies	0	Active
US11308254B2	Method and system for reducing layout distortion due to exposure non-uniformity	Physics	0	Active
US11055464B2	Critical dimension uniformity	Emerging Cross-Sectional Technologies	0	Active
US11476193B2	Semiconductor structure and manufacturing method thereof	Electricity	0	Active
US12254258B2	Critical dimension uniformity	Emerging Cross-Sectional Technologies	0	Active
US11209728B2	Mask and method for fabricating the same	Physics	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.