Substrate transfer device and substrate transfer method
US10867820B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2018 |
| Grant date | Dec 15, 2020 |
| Priority date | — |
| Expiry date | Jan 2, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2259/40088
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An atmospheric transfer device 20 includes a wafer transfer mechanism 101 holding and transferring a wafer W; a housing 100 accommodating the wafer transfer mechanism 101; a gas supply unit 110 supplying an inert gas into the housing 100; a gas circulation unit 140 returning a gas discharged from the housing 100 back into the housing 100; and a foreign substance removing unit 150 removing a foreign substance contained in the gas discharged from the housing 100. The foreign substance removing unit 150 includes a humidifying unit 160 configured to add moisture to the gas discharged from the housing 100; a filter 170 configured to adsorb and remove, by using the moisture, the foreign substance contained in the gas humidified by the humidifying unit 160; and a dehumidifying unit 180 configured to remove the moisture from the gas from which the foreign substance is removed by the filter 170.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.