Lithographic apparatus and a device manufacturing method
US10871715B2 · kind B2 · utility
0Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2019 |
| Grant date | Dec 22, 2020 |
| Priority date | — |
| Expiry date | Nov 21, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.