Mask blank for lithography and method of manufacturing the same
US10871721B2 · kind B2 · utility
1Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2019 |
| Grant date | Dec 22, 2020 |
| Priority date | — |
| Expiry date | Sep 17, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask for cleaning a lithography apparatus includes a mask substrate and a coating provided on a surface of the mask substrate. The coating is configured to trap particulate contaminant matter from the lithography apparatus. A method of cleaning a lithography tool is also provided preparing a cleaning mask including a particle trapping layer formed on a substrate. The method includes transferring the cleaning mask through a mask transferring route of the lithography tool. Subsequently, the method includes analyzing a particle trapped by the particle trapping layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.