Inventor · Hsinchu, TW

Ping-Hsun Lin

21Patents
2h-index
16Co-inventors
46Inventor score

Filing activity: Jun 19, 2017 → Jun 20, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US11042084B2 Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask Electricity 3 Active
US10295899B2 Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask Electricity 3 Active
US11422466B2 Photomask including fiducial mark and method of making semiconductor device using the photomask Electricity 2 Active
US12001132B2 Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask Electricity 1 Active
US11815804B2 EUV mask blank and method of making EUV mask blank Physics 1 Active
US11860532B2 Photomask including fiducial mark and method of making a semiconductor device using the photomask Electricity 1 Active
US11435660B2 Photomask and method of fabricating a photomask Physics 1 Active
US10871721B2 Mask blank for lithography and method of manufacturing the same Performing Operations; Transporting 1 Active
US12346020B2 Optical assembly with coating and methods of use Physics 0 Active
US12366797B2 EUV photo masks and manufacturing method thereof Physics 0 Active
US11982936B2 Photomask and method of fabricating a photomask Physics 0 Active
US12265322B2 EUV mask blank and method of making EUV mask blank Physics 0 Active
US12044959B2 EUV photo masks and manufacturing method thereof Physics 0 Active
US11592737B2 EUV photo masks and manufacturing method thereof Physics 0 Active
US11119398B2 EUV photo masks Electricity 0 Active
US12353120B2 EUV photo masks and manufacturing method thereof Physics 0 Active
US12181797B2 Extreme ultraviolet mask with alloy based absorbers Electricity 0 Active
US12346023B2 Optical assembly with coating and methods of use Physics 0 Active
US12339582B2 Photomask including fiducial mark and method of making a photomask Electricity 0 Active
US12400864B2 Methods and systems for improving plasma ignition stability Electricity 0 Active
US11287754B2 Mask blank for lithography and method of manufacturing the same Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.