Optical pulse generation for an extreme ultraviolet light source
US10887975B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2019 |
| Grant date | Jan 5, 2021 |
| Priority date | — |
| Expiry date | Jan 14, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2232
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.