Patent · US Active

Temperature-compensated micro-electromechanical device, and method of temperature compensation in a micro-electromechanical device

US10894713B2 · kind B2 · utility

0Cited by
38References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 5, 2018
Grant dateJan 19, 2021
Priority date
Expiry dateFeb 4, 2039

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/43
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A micro-electromechanical device includes a semiconductor substrate, in which a first microstructure and a second microstructure of reference are integrated. The first microstructure and the second microstructure are arranged in the substrate so as to undergo equal strains as a result of thermal expansions of the substrate. Furthermore, the first microstructure is provided with movable parts and fixed parts with respect to the substrate, while the second microstructure has a shape that is substantially symmetrical to the first microstructure but is fixed with respect to the substrate. By subtracting the changes in electrical characteristics of the second microstructure from those of the first, variations in electrical characteristics of the first microstructure caused by changes in thermal expansion or contraction can be compensated for.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.