Patent · US Active

Three dimensional vertically structured MISFET/MESFET

US10903371B2 · kind B2 · utility

3Cited by
5References
24Claims
0Family size

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Key dates

Filing dateJan 7, 2016
Grant dateJan 26, 2021
Priority date
Expiry dateJan 7, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/405

Abstract

According to one embodiment, an apparatus includes a substrate, and at least one three dimensional (3D) structure above the substrate. The substrate and the 3D structure each include a semiconductor material. The 3D structure also includes: a first region having a first conductivity type, and a second region coupled to a portion of at least one vertical sidewall of the 3D structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.