Patent · US Active

Scanning reticle including a grating formed in a substrate for an optical position measuring device

US10914615B2 · kind B2 · utility

0Cited by

2References

19Claims

0Family size

Assignee

DR. JOHANNES HEIDENHAIN GMBH · DE

Inventors

Stefan Funk · Leichlingen, DE
Andreas Hofmann · North Bend, US
Peter Speckbacher · Kirchweidach, DE

Key dates

Filing date	Jul 30, 2018
Grant date	Feb 9, 2021
Priority date	—
Expiry date	Mar 14, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/1871
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A scanning reticle for an optical position measuring device includes a substrate having an upper surface, operating in transmission, and having different functional regions. The upper surface includes at least one region having a grating made up of gaps and ribs, the ribs being formed in the substrate. The upper surface includes an antireflection layer, which is discontinuous in the region of the gaps.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.