Computer implemented method for determining intrinsic parameter in a stacked nanowires MOSFET
US10914703B2 · kind B2 · utility
2Cited by
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14Claims
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Key dates
| Filing date | Nov 30, 2017 |
| Grant date | Feb 9, 2021 |
| Priority date | — |
| Expiry date | Nov 15, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/938
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Embodiments of the invention determine intrinsic parameters of stacked nanowires/nanosheets GAA MOSFETs comprising Nw nanowires and/or nanosheets, each nanowire/nanosheet being surrounded in an oxide layer, the oxide layers being embedded in a common gate, wherein the method comprises the following steps:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.