Electrostatically clamped edge ring
US10923380B2 · kind B2 · utility
1Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2018 |
| Grant date | Feb 16, 2021 |
| Priority date | — |
| Expiry date | Nov 1, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68785
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An edge ring for use in a plasma processing chamber with a chuck is provided. An edge ring body has a first surface to be placed over and facing the chuck, wherein the first surface forms a ring around an aperture. A first elastomer ring is integrated to the first surface and extending around the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.