Patent · US Active

Substrate for an EUV-lithography mirror

US10935704B2 · kind B2 · utility

0Cited by

15References

10Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Claudia Ekstein · Ellwangen, DE
Holger Maltor · Aalen, DE

Key dates

Filing date	Jan 5, 2017
Grant date	Mar 2, 2021
Priority date	—
Expiry date	Jan 10, 2038

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31678
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates (1) including a base body (2) made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body (2) is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer (6) is preferably provided on a polishing layer (3) of the substrate (1) of the EUV mirror (5).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.