Holger Maltor
4Patents
1h-index
7Co-inventors
37Inventor score
Filing activity: Dec 4, 2007 → Jan 5, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8976927B2 | Substrate for mirrors for EUV lithography | Physics | 3 | Active |
| US8466047B2 | Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements | Electricity | 0 | Active |
| US8163632B2 | Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements | Electricity | 0 | Active |
| US10935704B2 | Substrate for an EUV-lithography mirror | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.