Patent · US Active

Chemical conversion of yttria into yttrium fluoride and yttrium oxyfluoride to develop pre-seasoned corossion resistive coating for plasma components

US10941303B2 · kind B2 · utility

3Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 13, 2017
Grant dateMar 9, 2021
Priority date
Expiry dateMar 6, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/334
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.